The NIST National Cybersecurity Center of Excellence (NCCoE), along with the SEMI Semiconductor Manufacturing Cybersecurity Consortium, has released Draft NIST Internal Report (NIST IR) 8546, Cybersecurity Framework (CSF) 2.0 Semiconductor Manufacturing Community Profile for public comment until 11:59 PM ET on Monday, April 14, 2025.
About the Draft
Draft NIST Internal Report (IR) 8546, Cybersecurity Framework 2.0 Semiconductor Manufacturing Community Profile, provides a voluntary, risk-based approach for managing cybersecurity activities and reducing cybersecurity risk to semiconductor manufacturing. The semiconductor manufacturing environment is a complex ecosystem of device makers, equipment OEMs, suppliers and solution providers. This Profile focuses on desired cybersecurity outcomes and can be used as a guideline to improve the current cybersecurity posture of the semiconductor manufacturing ecosystem.
“NIST, in collaboration with industry leaders and government agencies, has developed and is releasing a comprehensive Framework designed to safeguard semiconductor manufacturing from emerging threats and vulnerabilities,” said Sanjay Rekhi, group leader of the Security Components and Mechanisms Group at NIST. “This initiative is part of a broader, multi-year effort to strengthen the security of critical infrastructure, with a particular focus on the security of semiconductors and their supply chain.”